PARTICIPANTS
CHART (Participants / Countries)
 
All participants in person (92)Only participants fully registered (payment processed) will appear listed below
Last Name First Name Institution Country
Ahmad Ali CEA France
Akaram Sai Swaroop Fraunhofer ENAS Germany
Alberghina Daniele Kurt J. Lesker Company GmbH Germany
Anand Anamika TU Bergakedemie Freiberg, Institute of applied physics Germany
Bernabe Stephane CEA LETI France
Beyer Franziska C. Fraunhofer IISB Germany
Beyer Gerald imec Belgium
Büttel Gregor Fraunhofer ENAS Germany
Cattarinuzzi Emanuele STMicroelectronics Italy
Chakkalakunnan Bismiya fasni IM2NP, Aix Marseille University France
Charai Mohamed Institut Matériaux Microélectronique Nanosciences de Provence France
Cirulis Imants Fraunhofer ENAS Germany
Clair Maurice 3D-Micromac AG Germany
Clausner André Fraunhofer IKTS Germany
Correia Antonio Phantoms Foundation Spain
Cuartas-Schmidt Carolina JX Advanced Metals Corporation Germany
Czekalla Markus Infineon Technologies Germany
Das Rahul TU Bergakademie Freiberg (TUBAF) and Fraunhofer ENAS Germany
Depoorter Arno Ghent University Belgium
Detavernier Christophe Ghent University Belgium
Dick Daniel Chemnitz University of Technology Germany
Fenouillet-Beranger Claire CEA-LETI France
Ferreint-Roselli Lillà CEA-LETI France
Fournel Frank CEA-LETI France
Franz Mathias Fraunhofer ENAS Germany
Funaki Tatsuya Institute of Science Tokyo Japan
Gregoire Magali STMicroelectronics France
Grieve Daniel Infineon Technologies Dresden AG & Co KG Germany
Guhl Conrad Fraunhofer IPMS Germany
Gullo Matteo STMicroelectronics Italy
Hopkins Patrick E. University of Virginia USA
Hosseini Vahide Fraunhofer ENAS Germany
Ishizaka Tadahiro Tokyo Electron Limited Belgium
Israeli Tami Polyteknik AS Denmark
Jäckel Tobias TU Chemnitz and Fraunhofer ENAS Germany
Jha Himendra Materials Solutions Division - MKS Germany
Kafando Joelle Sephora STMicroelectronics France
Karavilovski Oliver JX Advanced Metals Corporation Germany
Kaßner Lysann Technische Universität Chemnitz Germany
Kirsch Peer Merck Electronics KGaA Germany
Kondratev Vladimir VON ARDENNE GmbH Germany
Kröner Marco VON ARDENNE GmbH Germany
Kühn Laura Infineon Technologies Dresden AG &Co. KG Germany
Kuwae Hiroyuki Sony Europe Ltd UK
Langer Wolfgang confovis GmbH Germany
Lee Mihee TANIOBIS GmbH Germany
Liberda Sergej Fraunhofer IPMS CNT Germany
Mancaleoni Alberto Tullio STMicroelectronics Italy
Mangelinck Dominique IM2NP/CNRS/AMU France
Mapelli Alessandro Confovis GmbH Germany
Merlin Marie CEA-LETI France
Miersch Christian Fraunhofer Technology Center High-Performance Materials THM Germany
Mignerot Florent Aix-Marseille Université France
Nakatsubo Hideaki Tanaka Precious Metal Technologies Japan
Nemouchi Fabrice CEA-LETI France
Nuez Hugo STMicroelectronics France
Ohba Takayuki Institute of Science Tokyo Japan
Opoku Francis Junior TU Chemnitz and Fraunhofer ENAS Germany
Pessina Luca STMicroelectronics Italy
Pharsole Sakshi Fraunhofer Institute for Electronic Nano Systems ENAS Germany
Posseme Nicolas CEA-LETI France
Presotto Ilaria STMicroeletronics Italy
Reghunath Namitha TU Chemnitz Germany
Reuter Danny Chemnitz University of Technology / Fraunhofer ENAS Germany
Rizzardini Simone STMicroelectronics Italy
Rodriguez Philippe CEA-LETI France
Roldan Jose Luis Phantoms Foundation Spain
Rollo Tommaso Applied Materials Inc Italy
Rupeliya Yogeshkumar TU Chemnitz and Fraunhofer ENAS Germany
Saint-Blancat Amandine STMicroelctronics France
Sanaei Ali TU Chemnitz, ZfM Germany
Sanchez Francisco Kurt J. Lesker Company GmbH Germany
Schulz Stefan E. Fraunhofer ENAS Germany
Schulze Andrea scia Systems GmbH Germany
Sciarrillo Samuele ST Microelectronics Italy
Segaud Roselyne CEA-LETI France
Soulie Jean-Philippe imec Belgium
Stender Matthias ChEmpower Corporation USA
Stolze Jens Applied Materials Europe Germany
Tallarida Graziella CNR-IMM Italy
Tasgit Oytun 3D-Micromac AG Germany
Tierno Davide IMEC: Interuniversitair Micro-Elektronica Centrum Belgium
Tschagaew Roman Institut für Angewandte Physik, TU Bergakademie Freiberg Germany
Urban Tobias 3-5 Power Electronics GmbH Germany
Van Dyck Seppe Ghent University Belgium
Vogel Klaus Fraunhofer ENAS Germany
Wunderle Bernhard TU Chemnitz Germany
Yin Xiao Infineon Technologies Dresden AG & Co. KG Germany
Zhang Qintong naura China
Zhao Rui JX Advanced Metals Corporation Germany
Zienert Andreas Fraunhofer ENAS Germany
Zimmermann Sven Fraunhofer ENAS Germany
Only participants fully registered (payment processed) will appear listed below 
 
 
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