PROGRAM
Tue 24 Wed 25 Thu 26
Session 5 - Silicides and Contacts
Chairperson: Graziella Tallarida
09:00-09:20 Pt redistribution in Ni(Pt)Si layers obtained via total vs partial reactions and its impact on specific contact resistivity Lillà Ferreint-Roselli,
CEA-LETI, France
09:20-09:40 Reactive diffusion in Ni-Co-Si Ternary system using Bilayer and Alloyed thin films Bismiya fasni Chakkalakunnan,
IM2NP, Aix Marseille University, France
09:40-10:00 Low-temperature formation of ultra-thin Co disilicide (CoSi₂) layers for advanced CMOS applications Joelle Sephora Kafando,
STMicroelectronics, France
10:00-10:20 Study of Doping Methods and Ge-PAI Conditions on Ti Silicidation for Advanced FD-SOI Nodes Marie Merlin,
CEA-LETI, France
10:20-10:40 The formation mechanism and kinetics of Ni₃GaAs nano-thin films on GaAs Mohamed Charai,
Institut Matériaux Microélectronique Nanosciences de Provence, France
10:40-11:10 Coffee Break / Posters / Exhibition
Session 6 - Analytical techniques, Characterisation & Reliabilty
Chairperson: Dominique Mangelinck
11:10-11:40 INVITED Co-Registered Automated Optical Inspection and Metrology for C4/TCB Micro-Bumps with Infrared Structured Illumination Microscopy of Bonded Interfaces Alessandro Mapelli,
Confovis, Germany
11:40-12:00 Assessment of defects and quality of thin films and interfaces with laser-based thermoreflectance thermal conductivity measurements Patrick E. Hopkins,
University of Virginia, USA
12:00-12:20 Pole figure measurements in grazing-incidence configuration for characterizing thin film texture Arno Depoorter,
Ghent University, Belgium
12:20-12:40 Shear tests of BEoL interfaces with in-situ SEM imaging Emanuele Cattarinuzzi,
STMicroelectronics, Italy
12:40-13:40 Lunch
Session7 - Memory / Novel Devices
Chairperson: Samuele Sciarrillo
13:40-14:00 TMD Superlattices for Phase Change Memory: Growth and Thermal Characterization Seppe Van Dyck,
Ghent University, Belgium
14:00-14:20 Crystallization investigations of Ge-rich GST cells using in situ thermal pulses coupled with STEM-EDX and HR-TEM analyses Florent Mignerot,
Aix-Marseille Université, France
14:20-14:40 GaAs pin diodes – highly efficient and simple power devices Tobias Urban,
3-5 Power Electronics GmbH, Germany
14:40-15:00 Magnetic Tunnel Junctions Based on Chiral Self-Assembled Monolayers Peer Kirsch,
Merck Electronics KGaA, Germany
15:00-15:20 Ti metallization for p-GaAsSb base contact Ali Ahmad,
CEA, France
15:20-15:50 Coffee Break / Posters / Exhibition
Session 8 - Unit Processes
Chairperson: Magali Gregoire
15:50-16:20 INVITED From Full-Field to Single-Spot: Laser-Based Processing for Microelectronics Maurice Clair,
3D-Micromac AG, Germany
16:20-16:40 Low-Pressure HF Vapor MACE of Silicon Nanowires: Pt vs Pd Catalyst Effects on Morphology and Etch Rate Vahide Hosseini,
Fraunhofer ENAS, Germany
16:40-17:00 Ion Beam-Based 3D Nanopatterning for Multilayer and Micro-Optical Devices Andrea Schulze,
scia Systems GmbH, Germany
18:30 Conference dinner
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